Post-CMP Cadmium Telluride Wafer Cleaner consists of a PP plastic outer enclosure, a cleaning process system, an inlet and outlet piping system, an exhaust system, an electrical control system, and a lighting system. It is mainly used for the post-CMP cleaning of cadmium telluride wafers, without affecting the physical properties of the workpiece, causing no damage to the workpiece. Working principle: Put Rectangle wafter on the workpieces by manually, and placed into each cleaning tank for cleaning in sequence, and after cleaning, they are manually removed.
Product Parameters
Production Flow:
Manual Load-Chemicals Ultrasonic Cleaning →QDR TankChemicals Ultrasonic Cleaning →Ultrasonic Cleaning→Dry Tank→Manual Unload
Major Materials:
(SUS304 Frame, Pp shell, sUs316 & PPTank)
Transportation:
(ManualTransporation)
Product Parameter
1)Production flow: Manual Load→Chemicals Ultrasonic Cleaning →QDR Tank-Chemicals Ultrasonic Cleaning -Ultrasonic CleaningDry Tank→Manual Unload
2)Major Material: SUS304 Frame, PP shell, SUS316 & PP Tank
3)The cleaning agent is weak alkali solution and DIW
Product feature and application
The equipment is used for Post-CMP Cadmium Telluride Wafer cleaning, and achieving cleanliness standards: the surface has no black or white spots and no fibers by visual inspection.
Product details
● The machine body is made of a metal welded frame, with an outer shell of milky white PP panels and a viewing window made of transparent PVC panels.
● Reasonable design, complete functions, and easy maintenance.
● Simple and convenient operation and maintenance, safe and reliable to use.
● Mature technology, adaptable to different cleaning processes.
● High efficiency, energy-saving, and environmentally friendly.
● Strong ultrasonic output.
● Made with high-quality raw materials and components, with stable and reliable performance.
● Features include adjustable cleaning time and high/low liquid level protection.
● Equipped with a set of water gun and air gun.
● Fitted with a liquid leakage detection device.
Latest news
In Oct. 2025, Post-CMP Cadmium Telluride Wafer Cleaner commissioning and start working on customer site for Hefei Tianyao.
Step Time
▼(Based on process, adjustable)
Others
Customized:Semiautomatic or manual
Product Qualifications
SDSE has:
20+ professional and experienced technical engineers,
4 international experts for technical support,
Over 150 patents,
ISO 9001:2015 certification,
Raw materials sourced from world-renowned brands such as Innodis, Pillar, Iwaki, White King, SMC, CKD, Röchling, and others.
Delivery, Shipping, and Service
Guarantee Period and After-Sales Service:
12 months from the date of the bill of lading. During this period, SDSE will provide spare parts free of charge for quality discrepancies caused by us. If issues arise due to incorrect operations by the buyer, spare parts will be provided at cost price.
Timely After-Sales Service:
24/7 online support, with on-site service within 48 hours.
Long-Term Service:
Beyond one year, SDSE will provide spare parts at cost price and offer long-term technical guidance.
★ FAQ
With a professional R&D team and extensive industry experience, we provide customized semiconductor cleaning solutions. We prioritize sincere and patient communication before sales, address customer concerns truthfully, ensure efficient production arrangements, and maintain strict quality control for raw materials, production processes, and pre-shipment inspections. Customers are welcome to visit us anytime.
★ Application Scenarios
In October 2024, the new PFA Parts Ultrasonic Cleaner was commissioned and began operation at a customer site for Cobetter Group.
Hot Tags: post-cmp cadmium telluride wafer cleaner, China post-cmp cadmium telluride wafer cleaner manufacturers
