The Silicon Wafer Texturing Cleaner uses concentrated alkali to remove the mechanical damage layer on the surface of monocrystalline silicon wafers. It forms an undulating pyramid texture to reduce surface reflection and enhance sunlight absorption. Additionally, the wet chemical cleaning process eliminates oil and metal impurities from the wafer surface.
Product Parameters
Cassette loading → Pre-cleaning → DIW cleaning → Damage layer removal (SDE) → DIW cleaning → Texturing process → DIW cleaning → POST 1 processing (SC1) → DIW cleaning → Chemical polishing → DIW cleaning → POST 2 processing (SC2) → DIW cleaning → HF cleaning → DIW cleaning → Pre-drying → Drying → Cassette unloading
Product Features and Applications
- Removes oil and metal impurities from silicon wafer surfaces.
- Prevents defects in monocrystalline silicon and ensures uniform texturing.
Product Details
√ Constructed with acid- and alkali-resistant materials; no corrosion for up to five years.
√ Supports overflow on two or four sides (equipped with V-shaped grooves).
√ Mechanical arms in the shared tank area feature interlocking functionality.
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