Automatic Phosphoric Acid Cleaner

Automatic Phosphoric Acid Cleaner

The Automatic Phosphoric Acid Cleaner for Sapphire Substrate consists of an LD feeding area, cleaning area, manipulator, ULD, and other components. It features automatic heating with a constant temperature and circulation device, ultrasonic cleaning, a spray fast-discharge bubbling overflow device, and a pipeline and electrical control system. The equipment is PLC-controlled and includes functions such as adjustable cleaning time, cleaning completion alerts, temperature control, high/low liquid level alarms, overflow protection, and leakage detection alarms.
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The Automatic Phosphoric Acid Cleaner for Sapphire Substrate consists of an LD feeding area, cleaning area, manipulator, ULD, and other components. It features automatic heating with a constant temperature and circulation device, ultrasonic cleaning, a spray fast-discharge bubbling overflow device, and a pipeline and electrical control system. The equipment is PLC-controlled and includes functions such as adjustable cleaning time, cleaning completion alerts, temperature control, high/low liquid level alarms, overflow protection, and leakage detection alarms.

 

Product Parameters

 

01/

Production Flow:

Manual Load → Spray Tank → Acid Cleaning Tank 1 → Acid Cleaning Tank 2 → Acid Cleaning Tank 3 → Acid Cleaning Tank 4 → HOF Tank → QDR Tank 1 → QDR Tank 2 → QDR Tank 3 → Manual Unload.

02/

Main Materials:

Metal frame + PP shell. Tanks are made of PPN, PTFE, or PVDF.

03/

Transportation:

Robotic arm transportation.

 

Product Features and Applications

 
 

Designed to clean sapphire substrates.

 

Contaminant Removal:

Effectively removes organic and inorganic contaminants and particles.

 
 

Surface Smoothing:

Uses chemical corrosion to smooth the surface and reduce defects.

 
 

Improved Adhesion:

Prepares the surface to enhance adhesion for subsequent film deposition.

 
 

Defect Reduction:

Minimizes surface defects to improve product quality.

 

 

Product Details

 

Cleaning Process:
 

Phosphoric Acid Solution:

Chemical cleaning using a phosphoric acid solution.

Temperature Control:

Precise temperature regulation to ensure optimal results.

Ultrasonic-Assisted Cleaning:

Enhances cleaning effectiveness with ultrasonic technology.

Automation:

Fully automatic operation reduces human error and increases efficiency.

 

Advantages

 

Efficient:

Automated operation improves cleaning efficiency.

Consistent Results:

Ensures uniform cleaning across batches.

Environmentally Friendly:

Reduces chemical usage and wastewater discharge.

 

 

Application Scenarios

 

 

◇ In March 2025, the Automatic Phosphoric Acid Cleaner for Sapphire Substrate was commissioned and began operation at the customer site for Ningxia JSG.

 

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