The Wafter cleaner for Before-annealing (SGY40-06C) consists of a feeding table, ultrasonic alkali washing tank 1, ultrasonic alkali washing tank 2, ultrasonic alkali washing tank 3, a QDR tank, ultrasonic rinsing tank 1, ultrasonic rinsing tank 2, and a blanking table, totaling 6 stations. Its working principle involves mechanical vibration with strong ultrasonic penetration to impact the workpiece surface, combined with the chemical decontamination effect of the cleaning agent. This ensures thorough separation, cleaning, and reaction of gem pieces and impurities, resulting in a cleaner surface.
Product Parameters
Production Flow:
Feeding table & manual loading → Ultrasonic alkali washing tank 1 → Ultrasonic alkali washing tank 2 → Ultrasonic alkali washing tank 3 → QDR tank → Ultrasonic rinsing tank 1 → Ultrasonic rinsing tank 2 → Unloading.
Main Materials:
Metal frame + PP shell. Tanks are made of SUS316 and NPP.
Transportation:
Robotic arm transportation.
Product Features and Applications
Designed to clean sapphire substrates before the annealing process.
Product Details
When combined with a suitable cleaning agent, it effectively removes particles from the sapphire substrate before wafer annealing.
The cleaning agent and ultrasonic treatment do not affect the physical properties of the workpiece, and the workpiece remains free from damage.
Application Scenarios
◇ In October 2023, three sets of Wafter cleaner for Before-annealing were commissioned and began operation at the customer site for Istar Wafer Qingdao.
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